![]() |
Volumn 46, Issue 1, 1999, Pages 369-373
|
Bilayer resist used in e-beam lithography for deep narrow structures
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ELECTRON BEAM LITHOGRAPHY;
OPTICAL RESOLVING POWER;
PHOTOSENSITIVITY;
BILAYER RESIST SYSTEMS;
PHOTORESISTS;
|
EID: 0033131590
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-9317(99)00107-0 Document Type: Article |
Times cited : (7)
|
References (9)
|