Bilayer resist used in e-beam lithography for deep narrow structures

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 369-373

  Van Delft, Falco C M J M ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; OPTICAL RESOLVING POWER; PHOTOSENSITIVITY;

BILAYER RESIST SYSTEMS;

PHOTORESISTS;

EID: 0033131590     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00107-0     Document Type: Article

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