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Volumn 4408, Issue , 2001, Pages 510-521

Mathematical modeling of sputtering-induced surface roughness

Author keywords

Beam profile; Focused ion beam; Micromachining; Silicon; Sputtering; Surface roughness

Indexed keywords

ACCELERATION; BINDING ENERGY; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; ION BEAMS; MICROELECTRONICS; MICROMACHINING; SPUTTER DEPOSITION;

EID: 0034872813     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425392     Document Type: Conference Paper
Times cited : (1)

References (25)
  • 13
    • 0004031916 scopus 로고    scopus 로고
    • Fabrication of three dimensional microcomponents - A review
    • The Inst. of Engineers, Dhaka, Bangladesh
    • (2000) st Century , pp. 418-427
    • Ali, M.Y.1    Hung, N.P.2
  • 19
    • 0000951310 scopus 로고    scopus 로고
    • A novel procedure for measuring the absolute current density profile of a focused gallium-ion beam
    • (1996) App. Phy. Lett. , vol.69 , Issue.18 , pp. 2764-2766
    • Wang, J.B.1    Wang, Y.L.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.