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Volumn 4408, Issue , 2001, Pages 510-521
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Mathematical modeling of sputtering-induced surface roughness
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Author keywords
Beam profile; Focused ion beam; Micromachining; Silicon; Sputtering; Surface roughness
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Indexed keywords
ACCELERATION;
BINDING ENERGY;
CRYSTAL MICROSTRUCTURE;
CRYSTAL ORIENTATION;
CRYSTALLOGRAPHY;
ION BEAMS;
MICROELECTRONICS;
MICROMACHINING;
SPUTTER DEPOSITION;
FOCUSSED ION BEAMS (FIB);
SURFACE ROUGHNESS;
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EID: 0034872813
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.425392 Document Type: Conference Paper |
Times cited : (1)
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References (25)
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