Reticle enhancement technology: Implications and challenges for physical design

Proceedings - Design Automation Conference

Volumn , Issue , 2001, Pages 73-78

  Grobman, W ^a   Thompson, M ^a   Wang, R ^a   Yuan, C ^a   Tian, R ^a   Demircan, E ^a  

^a MOTOROLA INC   (United States)

Author keywords

Mask data preparation; OPC; Optical proximity correction; PSM; RET; Reticle enhancement technology; Subwavelength lithography; Tiling

Indexed keywords

MASKS; OPTICAL FILMS; OPTIMIZATION; PHASE SHIFT;

RETICLE ENHANCEMENT TECHNOLOGY (RET);

PHOTOLITHOGRAPHY;

EID: 0034848821     PISSN: 0738100X     EISSN: None     Source Type: Journal    
DOI: 10.1109/DAC.2001.156111     Document Type: Article

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