Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4175-4178

  Yen, Anthony ^a,c   Tritchkov, Alexander ^a   Stirniman, John P ^b   Vandenberghe, Geert ^a   Jonckheere, Rik ^a   Ronse, Kurt ^a   Van Den Hove, Luc ^a  

^a IMEC   (Belgium)

^b Precim Company   (United States)

^c TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007962421     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588615     Document Type: Article

References (16)

1. R. Pforr, A. Wong, K. Ronse, L. Van den hove, A. Yen, S. Palmer, G. Fuller, and O. Otto, Proc. SPIE 2440, 150 (1995).
2. A. Yen, P. Tzviatkov, and G. Grozev, Solid State Technol. 39, S13 (1996).
3. J. Garofalo, J. DeMarco, J. Bailey, J. Xiao, and S. Vaidya, Proc. SPIE 2440, 171 (1995).
4. T. Hanawa, K. Kamon, A. Nakae, S. Nakao, and K. Moriizumi, Proc. SPIE (in press).
5. T. Brunner and R. A. Ferguson, Proc. SPIE (in press).
6. S. Inoue, T. Fujisawa, S. Tanaka, S. Mimotogi, A. Nikki, and I. Mori, Proc. SPIE 2440, 240 (1995).
7. R. R. Vallishayee, S. A. Orszag, and E. Barouch, Proc. SPIE (in press).
8. J. P. Stirniman and M. L. Rieger, Proc. SPIE 2197, 294 (1994).
9. D. Gabor, in Progress in Optics 1, edited by E. Wolf (North-Holland, Amsterdam, 1964).
10. Y. C. Pati and T. Kailath, J. Opt. Soc. Am. A 11, 2438 (1994).
11. J. Xiao, J. Garofalo, R. Cirelli, and S. Vaidya, J. Vac. Sci. Technol. B 13, 2897 (1995).
12. Shipley Company, Inc., Newton, Massachusetts 02162.
13. Brewer Science, Inc., Rolla, Missouri 65401.
14. W. Conley, G. Breyta, B. Brunsvold, R. DePietro, D. Hofer, S. Holmes, H. Ito, R. Nunes, and G. Fichtl, Proc. SPIE (in press).
15. M. L. Rieger and J. P. Stirniman, Proc. SPIE 2197, 371 (1994).
16. PROXIMA™ User's Guide, Precim Company, Portland, Oregon 92719.