Advanced technology for extending optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Wagner, Christian ^a   Kaiser, Winfried ^a   Mulkens, Jan ^a   Flagello, Donis G ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT POLARIZATION; MASKS; SCANNING;

CRITICAL DIMENSION (CD); DEPTH OF FOCUS (DOF);

PHOTOLITHOGRAPHY;

EID: 0033700371     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)