Ultra-large lateral grain growth by double laser recrystallization of a-Si films

Applied Physics A: Materials Science and Processing

Volumn 73, Issue 3, 2001, Pages 317-322

  Lee, M ^a   Moon, S ^a   Hatano, M ^b   Grigoropoulos, C P ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; EXCIMER LASERS; GRAIN GROWTH; LASER BEAM EFFECTS; POLYSILICON; PULSE MODULATION; RECRYSTALLIZATION (METALLURGY); SURFACE ROUGHNESS;

LASER RECRYSTALLIZATION;

THIN FILMS;

EID: 0034835902     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390100874     Document Type: Article

References (12)