Si-nanostructures made by laser-annealing

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 2, 1998, Pages 938-942

  Groos, G ^a   Stutzmann, M ^a  

^a WALTER SCHOTTKY INSTITUT   (Germany)

Author keywords

Amorphous silicon; Atomic force microscopy; Laser interference annealing; Microcrystalline silicon; Raman scattering; Silicon nanostructures

Indexed keywords

AMORPHOUS SILICON; ANNEALING; ATOMIC FORCE MICROSCOPY; CARRIER CONCENTRATION; LASER APPLICATIONS; MASKS; NANOSTRUCTURED MATERIALS; OXIDATION; RAMAN SCATTERING; SEMICONDUCTOR QUANTUM DOTS; SEMICONDUCTOR QUANTUM WIRES;

LASER ANNEALING PROCESSES; MICROCRYSTALLINE SILICON;

SEMICONDUCTING SILICON;

EID: 0032068682     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00265-8     Document Type: Article

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