Hot carrier lifetime and dielectric breakdown in MOSFETs processed with deuterium

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 2001, Pages 80-85

  Clark, W F ^a   Cartier, E ^a   Wu, E Y ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DEUTERIUM; DIELECTRIC MATERIALS; ELECTRIC BREAKDOWN; FIELD EFFECT TRANSISTORS; HOT CARRIERS; LEAKAGE CURRENTS; MOS CAPACITORS; STRESS ANALYSIS;

DIELECTRIC BREAKDOWN;

MOSFET DEVICES;

EID: 0034828964     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)