Production x-ray lithography stepper for 100-nm device fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue 1, 2001, Pages 164-175

  Li, Xuan ^a   Miyatake, Tsutomu ^a   Hirose, Sayumi ^a   Hirose, Masaoki ^a   Fujii, Katsumi ^b   Suzuki, Kiyoshi ^a  

^a SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

^b NEC CORPORATION   (Japan)

Author keywords

Alignment; Handing unit; Overlay accuracy; Proximity gap; Stepper; Throughput; Vertical stage; X ray lithography

Indexed keywords

DIGITAL SIGNAL PROCESSING; LIGHT SCATTERING; MASKS; OPTICAL SENSORS; STEP RESPONSE; SYNCHROTRON RADIATION; WSI CIRCUITS;

DIRECT GAP SETTING (DGS);

X RAY LITHOGRAPHY;

EID: 0034768935     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436646     Document Type: Article

References (16)

1. 2 cell area) 1 Gb DRAM technology
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4. Alignment mark optimization to redue too-and wafer-induced Shift for XRA-100
5. Current status and technology of PXL stepper
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7. 22nm overlay accuracy of SR stepper using an improved chromatic bifocus alignment system
8. Status of "AURORA-2S" and Its facility for x-ray lithography
9. Current status of AURORA-2S and a PXL beam line
10. Optical design of high-performance beam lines for x-ray lithography
11. Performance of a compact beam line with high brightness for x-ray lithography
12. Scattered-light alignment system using SiC mask for x-ray lithography
13. Impact of metallization films on scattered-light alignment for x-ray lithography
14. Nanometer scattered-light alignment system using SiC x-ray masks with low optical transparency
15. Evaluation of alignment accuracy in processed wafers and SIC masks on a scattered-light alignment system for x-ray aligners