Laser-induced EUV source for optics characterization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue 1, 2001, Pages 559-565

  Kranzusch, S ^a   Mann, K ^a  

^a LASER LABORATORIUM GÖTTINGEN E V   (Germany)

Author keywords

13nm radiation; EUV optics; Hartmann Shack sensor; Laser induced plasma; Multilayer mirror; Wavefront measurement

Indexed keywords

CAMERAS; LASER PRODUCED PLASMAS; OPTICAL SYSTEMS; PHOTODIODES; SENSORS; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTROMETERS; WAVEFRONTS;

EXTREME ULTRAVIOLET (EUV) SOURCES; HARTMANN-SHACK SENSORS;

LASER OPTICS;

EID: 0034763271     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436688     Document Type: Article

References (8)