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Volumn 273, Issue 3, 2000, Pages 208-211
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Strong violet emission from Ge-SiO2 co-sputtered films annealed in O2 atmosphere
a
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Author keywords
Magnetron sputtering; Photoluminescence
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Indexed keywords
COLOR CENTERS;
GERMANIUM OXIDES;
LIGHT ABSORPTION;
MAGNETRON SPUTTERING;
PHOTOLUMINESCENCE;
SILICA;
ANNEALING TEMPERATURES;
CO-SPUTTERED FILMS;
DEVICE APPLICATION;
EXCITATION LINES;
FOURIER TRANSFORM INFRARED ABSORPTION;
PHOTOLUMINESCENCE SPECTRUM;
PL EXCITATIONS;
VIOLET EMISSION;
ANNEALING;
GERMANIUM DERIVATIVE;
NITROGEN;
OXYGEN;
SILICON DERIVATIVE;
SILICON DIOXIDE;
XENON;
ARTICLE;
DENSITY;
FILM;
FOURIER TRANSFORMATION;
INFRARED RADIATION;
LIGHT ABSORPTION;
LUMINESCENCE;
PHOTODYNAMICS;
ULTRAVIOLET RADIATION;
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EID: 0034698624
PISSN: 03759601
EISSN: None
Source Type: Journal
DOI: 10.1016/S0375-9601(00)00492-8 Document Type: Article |
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Times cited : (14)
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References (17)
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