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Journal of Molecular Structure: THEOCHEM

Volumn 506, Issue 1-3, 2000, Pages 273-286

Quantum chemical study of aluminum CVD reaction for titanium nitride (111) surface with terminal fluorine

Author keywords

Aluminum; Chemical vapor deposition; Coupled cluster calculation; Density functional theory; Periodic boundary calculation; Surface termination; Titanium nitride

Indexed keywords

ALUMINUM; FLUORINE; TITANIUM;

CALCULATION; CHEMICAL ANALYSIS; CHEMICAL REACTION; CONFERENCE PAPER; DENSITY; ENERGY; ENTHALPY; MOLECULAR MODEL; QUANTUM MECHANICS; VAPOR;

EID: 0034648009 PISSN: 01661280 EISSN: None Source Type: Journal
DOI: 10.1016/S0166-1280(00)00419-X Document Type: Conference Paper

Times cited : (2)

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