Quantum chemical study on p-doping effect of silicon surface reaction with silane

Applied Surface Science

Volumn 117-118, Issue , 1997, Pages 47-53

  Tachibana, Akitomo ^a   Yano, Tasuku ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

CVD; p doping effect; Quantum chemistry; Reaction; Silane

Indexed keywords

ACTIVATION ENERGY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; DECOMPOSITION; HYDROGEN; REACTION KINETICS; SEMICONDUCTOR DOPING; SILANES; SURFACE PHENOMENA;

QUANTUM CHEMISTRY;

SEMICONDUCTING SILICON;

EID: 0031548784     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)80050-5     Document Type: Article

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