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Applied Surface Science

Volumn 117-118, Issue , 1997, Pages 151-157

Quantum chemical study on low energy reaction path for SiH 4 + O( 1 D) → SiO + 2H 2

(2) Tachibana, Akitomo a Sakata, Ken a

a KYOTO UNIVERSITY (Japan)

Author keywords

CVD; Quantum chemistry; Reaction; Single oxygen; SiO 2

Indexed keywords

CHEMICAL VAPOR DEPOSITION; HYDROGEN; OXIDATION; OXYGEN; SEMICONDUCTING SILICON; SILANES; SILICA;

QUANTUM CHEMISTRY;

REACTION KINETICS;

EID: 0031548608 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)80070-0 Document Type: Article

Times cited : (11)

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