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Applied Surface Science

Volumn 117-118, Issue , 1997, Pages 158-165

Quantum chemical study of reaction path for NH (a 1 Δ) with SiH 4

(2) Tachibana, Akitomo a Yano, Tasuku a

a KYOTO UNIVERSITY (Japan)

Author keywords

CVD; Quantum chemistry; Reaction; Silicon nitride; Single NH

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPLEXATION; SEMICONDUCTING SILICON; SILANES; SILICON NITRIDE;

NITRIDATION; QUANTUM CHEMISTRY;

REACTION KINETICS;

EID: 0031548370 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)80071-2 Document Type: Article

Times cited : (1)

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