Additive fabrication of integrated ferroelectric thin-film capacitors using self-assembled organic thin-film templates

Advanced Materials

Volumn 9, Issue 11, 1997, Pages 891-895

  Jeon, Noo Li ^a   Clem, Paul ^a   Jung, Duk Young ^a   Lin, Wenbin ^a   Girolami, Gregory S ^a,b   Payne, David A ^a   Nuzzo, Ralph G ^a,b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b United States of America   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DATA STORAGE EQUIPMENT; FERROELECTRIC DEVICES; FILM GROWTH; INFRARED DEVICES; MONOLAYERS; NUCLEATION; SEMICONDUCTOR DEVICE STRUCTURES; THIN FILMS;

FERROELECTRIC CAPACITORS; MICROMACHINES; MOLECULAR TEMPLATES; SELF ASSEMBLED MONOLAYERS;

CAPACITORS;

EID: 0031551391     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.19970091107     Document Type: Article

References (33)

1. VLSI Technology, 2nd ed. (Ed: S. M. Sze), McGraw-Hill, New York 1988.
2. R. E. Jones, S. B. Desu, MRS Bull. 1996, 21 (June), 55.
3. P. Singer, Semicond. Int. 1995, Dec., 65.
4. M. Taylor, Semicond. Int. 1996, July, 162.
5. L. F. Weber, J. D. Birk, MRS Bull. 1996, 21 (March), 65.
6. R. J. Jackman, J. L. Wilbur, G. M. Whitesides, Science 1995, 269, 664.
7. R. G. Larson, T. J. Rehg, in Liquid Film Coating (Eds: S. F. Kistler, P. M. Schweitzer), Chapman & Hall, London 1997, p. 709.
8. A. Kumar, H. A. Biebuyck, N. L. Abbott, G. M. Whitesides, J. Am. Chem. Soc. 1992, 114, 9188.
9. A. Kumar, G. M. Whitesides, Appl. Phys. Lett. 1993, 63, 2002.
10. A. Kumar, H. A. Biebuyck, G. M. Whitesides, Langmuir 1994, 10, 1499.
11. J. L. Wilbur, A. Kumar, E. Kim, G. M. Whitesides, Adv. Mater. 1994, 6, 600.
12. J. M. Calvert, in Lithographically Patterned Self-Assembled Films (Ed: A. Ulman), Academic, San Diego, CA 1993, Vol. 20, p. 109.
13. J. M. Calvert, M. S. Chen, C. S. Dulcey, J. H. Georger, M. C. Peckerar, J. M. Schnur, P. E. Schoen, J. Electrochem. Soc. 1992, 139, 1677.
14. C. S. Dulcey, J. H. Georger, V. Krauthamer, D. A. Stenger, T. L. Fare, J. M. Calvert, Science 1991, 252, 551.
15. M. Lercel, R. C. Tiberio, P. F. Chapman, H. G. Craighead, C. W. Sheen, A. N. Parikh, D. L, Allara, J. Vac. Sci. Technol. B 1993, 11, 2823.
16. G. Gillen, S. Wright, J. Bennett, M. J. Tarlov, Appl. Phys. Lett. 1994, 65, 534.
17. C. B. Ross, L. Sun, R. M. Crooks, Langmuir 1993, 9, 632.
18. Y. T. Kim, A. J. Bard, Langmuir 1992, 8, 1096.
19. K. K. Berggren, A. J. Bard, J. L. Wilbur, J. D. Gillaspy, A. G. Helg, J. J. McClelland, S. L. Rolston, W. D. Phillips, M. Prentiss, G. M. Whitesides, Science 1995, 269, 1255.
20. N. L. Jeon, R. G. Nuzzo, Y. Xia, M. Mrksich, G. M. Whitesides, Langmuir 1995, 11, 3024.
21. N. L. Jeon, P. G. Clem, D. A. Payne, R. G. Nuzzo, Langmuir 1996, 12, 5350.
22. N. L. Jeon, W. Lin, G. S. Girolami, R. G. Nuzzo, Langmuir, in press.
23. N. L. Jeon, P. G. Clem, D. A. Payne, R. G. Nuzzo, J. Mater. Res. 1995, 10, 2996.
24. P. G. Clem, N. L. Jeon, R. G. Nuzzo, D. A. Payne, J. Am. Ceram. Soc., in press.
25. J. S. Horwitz, D. B. Chrisey, J. M. Pond, R. C. Y. Auyeung, C. M. Cotell, K. S. Grabowski, M. S. Kluskens, Integrated Ferroelectrics 1995, 8, 5150.
26. J. F. Scott, C. A. P. Araujo, Science 1989, 246, 1400.
27. K. R. Udayakumar, Ferroelectric Thin Films II (Eds: A. I. Kingon, E. R. Myers, B. A. Tuttle), MRS, Pittsburgh, PA 1992.
28. C. Ye, T. Tamagawa, D. L. Polla, J, Appl. Phys. 1991, 70, 5538.
29. K. Sameshima, T. Nakamura, K. Hoshiba, A. Kamisawa, T. Atsuki, N. Soyama, K. Ogi, Jpn. J. Appl. Phys. 1993, 32, 4144.
30. G. E. Menk, S. B. Desu, W. Pau, D. P. Vijay, Ferroelectric Thin Films V (Eds: S. B. Desu, R. Ramesh, B. A. Tuttle, R. E, Jones, I. K. Yoo), MRS, Pittsburgh, PA 1996.
31. C. D. E. Lakeman, D. A. Payne, J. Am. Ceram. Soc. 1992, 74, 3091.
32. Metallization schemes other than Pt do not tolerate this latter step.
33. We used a large area base electrode to which a connection could be made by stripping a portion of the three-layer assembly.