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Volumn 171, Issue 4, 2000, Pages 443-447

Thermal donor formation in crystalline silicon irradiated by high energy ions

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BORON; CARRIER CONCENTRATION; CRYSTALLINE MATERIALS; ION IMPLANTATION; IRRADIATION; KRYPTON; NITROGEN; POINT DEFECTS; RADIATION EFFECTS;

EID: 0034543297     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00296-2     Document Type: Article
Times cited : (9)

References (18)
  • 11
    • 85031542557 scopus 로고
    • Toulouse
    • G.D. Watkins, Toulouse, 1967, A1.
    • (1967)
    • Watkins, G.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.