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Volumn 171, Issue 4, 2000, Pages 443-447
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Thermal donor formation in crystalline silicon irradiated by high energy ions
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
BORON;
CARRIER CONCENTRATION;
CRYSTALLINE MATERIALS;
ION IMPLANTATION;
IRRADIATION;
KRYPTON;
NITROGEN;
POINT DEFECTS;
RADIATION EFFECTS;
INTERSTITIALS;
THERMAL DONORS;
VACANCIES;
SILICON;
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EID: 0034543297
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(00)00296-2 Document Type: Article |
Times cited : (9)
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References (18)
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