Megasonic, non-contact cleaning followed by 'Rotagoni' drying of CMP wafers

Diffusion and Defect Data Pt.B: Solid State Phenomena

Volumn 76-77, Issue , 2000, Pages 251-254

  Lauerhaas, Jeff ^a   Mertens, Paul W ^a   Nicolosi, Tom ^b   Kenis, Karine ^a   Fyen, Wim ^a   Heyns, Marc ^a  

^a IMEC   (Belgium)

^b Verteq Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; DRYING; NITROGEN; PARTICLE SIZE ANALYSIS; SILICA; ULTRASONIC CLEANING;

MEGASONICS; NONCONTACT GOLDFINGER CLEANING; ROTAGONI DRYING; SPIN DRYING;

MOS DEVICES;

EID: 0034507058     PISSN: 10120394     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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