Integrated CMP clean methods

European Semiconductor

Volumn 21, Issue 7, 1999, Pages 36-38

  Davenport, Rob ^a   Brown, Brian ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CLEANING; CHEMICAL POLISHING; COST EFFECTIVENESS;

CHEMICAL MECHANICAL POLISHING (CMP);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032676273     PISSN: 02656027     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (4)