Etching and surface smoothing with gas-cluster ion beams

Materials Research Society Symposium - Proceedings

Volumn 585, Issue , 2000, Pages 27-32

  Fenner, D B ^a   Torti, R P ^a   Allen, L P ^a   Toyoda, N ^b   Kirkpatrick, A R ^a   Greer, J A ^a   Difilippo, V ^c   Hautala, J ^a  

^a Epion Corporation   (United States)

^b Massachusetts Institute of Technology   (United States)

^c Tufts University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GAS CLUSTERS; MICROELECTRONIC MATERIALS; SURFACE SMOOTHING;

ETCHING; ION BEAMS; ION BOMBARDMENT; SURFACE ROUGHNESS;

SURFACE STRUCTURE;

EID: 0034504740     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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