Rapid photothermal processing as a semiconductor manufacturing technology for the 21st century

Applied Surface Science

Volumn 168, Issue 1-4, 2000, Pages 198-203

  Singh, R ^a   Fakhruddin, M ^a   Poole, K F ^a  

^a CLEMSON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; INTEGRATED CIRCUIT MANUFACTURE; PHOTOCHEMICAL REACTIONS; SILICON WAFERS; SOLAR CELLS;

QUANTUM PHOTO EFFECTS; RAPID PHOTOTHERMAL PROCESSING;

RAPID THERMAL ANNEALING;

EID: 0034500616     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00590-0     Document Type: Article

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