How rapid isothermal processing can be a dominant semiconductor processing technology in the 21st century

Materials Research Society Symposium - Proceedings

Volumn 429, Issue , 1996, Pages 81-94

  Singh, R ^a   Sharangpani, R ^a   Cherukuri, K C ^a   Chen, Y ^a   Dawson, D M ^a   Poole, K F ^a   Rohatgi, A ^a   Narayanan, S ^a   Thakur, R P S ^a  

^a CLEMSON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL SYSTEMS; COST EFFECTIVENESS; EFFICIENCY; MICROELECTRONIC PROCESSING; OPTIMIZATION; PERFORMANCE; PROCESS CONTROL; RELIABILITY; SYSTEMS ANALYSIS; TECHNOLOGY;

PHOTOTHERMAL EFFECTS; QUANTUM PHOTOEFFECTS; RAPID ISOTHERMAL PROCESSING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030400493     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-429-81     Document Type: Conference Paper

References (35)