Carbon segregation in silicon

Thin Solid Films

Volumn 380, Issue 1-2, 2000, Pages 75-77

  Oehme, M ^a   Bauer, M ^a   Parry, C P ^a   Eifler, G ^a   Kasper, E ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; HETEROJUNCTION BIPOLAR TRANSISTORS; INTERDIFFUSION (SOLIDS); SEGREGATION (METALLOGRAPHY); SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING;

SURFACE SEGREGATION;

SEMICONDUCTING FILMS;

EID: 0034497835     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01533-9     Document Type: Article

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