Reactive ion etching of CVD diamond films for MEMS applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4230, Issue , 2000, Pages 224-230

  Guifu, Ding ^a   Xiaolin, Zhao ^a   Aibin, Yu ^a   Chunsheng, Yang ^a   Bingchu, Cai ^a   Xiang, Yao ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

CVD diamond films; Diamond tips MEMS applications; Reactive Ion Etching; Surface micromachining

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; PATTERNMAKING; PHOTOLITHOGRAPHY; PRESSURE EFFECTS; REACTIVE ION ETCHING; SPUTTERING; SURFACE ROUGHNESS;

WET ETCHING PROCESS;

DIAMOND FILMS;

EID: 0034453344     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.404907     Document Type: Article

References (15)

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