Self-aligned micromachining process for large-scale, free-space optical cross-connects

Journal of Lightwave Technology

Volumn 18, Issue 12, 2000, Pages 1785-1791

  Helin, P ^a   Mita, M ^a   Bourouina, T ^a   Reyne, G ^a   Fujita, H ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Optical cross connects; Optical device fabrication; Optical switches; Silicon bulk micromachining

Indexed keywords

DRY ETCHING; INSERTION LOSSES; LARGE SCALE SYSTEMS; MICROMACHINING; MIRRORS; OPTICAL FIBER FABRICATION; OPTICAL SWITCHES; OPTICAL WAVEGUIDES; SEMICONDUCTING SILICON; SPACE OPTICS;

ANISOTROPIC WET ETCHING; DEEP DRY ETCHING; FIBER GUIDES; FREE SPACE OPTICAL CROSS CONNECTS; LARGE SCALE OPTICAL CROSS CONNECTS; OPTICAL ALIGNMENT; SELF-ALIGNED MICROMACHINING PROCESS; SILICON BULK MICROMACHINING; VERTICAL MIRRORS;

OPTICAL INTERCONNECTS;

EID: 0034452938     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/50.908730     Document Type: Article

References (15)

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