Mechanisms of Pb(Zr0.53Ti0.47)O3 thin film etching with ECR/RF reactor

Integrated Ferroelectrics

Volumn 31, Issue 1-4, 2000, Pages 261-271

  Baborowski, J ^a   Muralt, P ^a   Ledermann, N ^a   Colla, E ^a   Seifert, A ^a   Gentil, S ^a   Setter, N ^a  

^a EPFL   (Switzerland)

Author keywords

ECR RF reactor; MEMS patterning; Plasma etching; PZT

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; ELECTRON CYCLOTRON RESONANCE; FERROELECTRIC DEVICES; LEAD COMPOUNDS; MICROELECTROMECHANICAL DEVICES; NATURAL FREQUENCIES; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ETCHING SELECTIVITY; FERROELECTRIC CAPACITIVE DEVICES; LEAD ZIRCONIUM TITANATE THIN FILM;

FERROELECTRIC THIN FILMS;

EID: 0034449315     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584580008215659     Document Type: Conference Paper

References (12)