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Volumn 39, Issue 12 B, 2000, Pages 7011-7014

Effects of SF6 addition to O2 plasma on polyimide etching

Author keywords

Low k; Optical emission spectroscopy; Plasma etching; Polyimide; Selectivity

Indexed keywords

ADDITION REACTIONS; ELECTRON CYCLOTRON RESONANCE; FLUORINE COMPOUNDS; OXYGEN; POLYIMIDES; SEMICONDUCTING SILICON; SPECTROSCOPY; SUBSTRATES;

INTERLAYER DIELECTRICS;

PLASMA ETCHING;

EID: 0034429408 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.39.7011 Document Type: Article

Times cited : (5)

References (16)

1
- 0001247632
- R. D. Tacito and C. Steinbruchel: J. Electrochem. Soc. 143 (1996) 1974.
- (1996) J. Electrochem. Soc. , vol.143 , pp. 1974
- Tacito, R.D.¹ Steinbruchel, C.²

2
- 0002798108
- June
- I. Morey and A. Asthana: Solid State Technol. (1999) June, 71.
- (1999) Solid State Technol. , pp. 71
- Morey, I.¹ Asthana, A.²

3
- 0031248720
- D. T. Price, R. J. Gutmanna and S. P. Murarka: Thin Solid Films. 308-309 (1997) 523.
- (1997) Thin Solid Films. , vol.308-309 , pp. 523
- Price, D.T.¹ Gutmanna, R.J.² Murarka, S.P.³

4
- 20444420036
- B. Zhao, et al.: 1998 Symp. on Very Large Scale Integrated Technology Dig. Tech. Pap. 1998, p. 28.
- (1998) 1998 Symp. on Very Large Scale Integrated Technology Dig. Tech. Pap. , pp. 28
- Zhao, B.¹

5
- 20444399401
- J. C. Maisonobe, G. Passemard, C. Lacour, C. Lecornec, P. Motte, P. Noel and J. Torres: Dig. 1999 the Dielectrics for ULSI/VLSI Multilevel Interconnections Conf., 1999, p. 60.
- (1999) Dig. 1999 the Dielectrics for ULSI/VLSI Multilevel Interconnections Conf. , pp. 60
- Maisonobe, J.C.¹ Passemard, G.² Lacour, C.³ Lecornec, C.⁴ Motte, P.⁵ Noel, P.⁶ Torres, J.⁷

6
- 0004237371
- Marcel Dekker, Inc.
- M. K. Ghosh and K. L. Mittal: Polyimides: Fundamentals and Applications (Marcel Dekker, Inc., 1996) p. 309.
- (1996) Polyimides: Fundamentals and Applications , pp. 309
- Ghosh, M.K.¹ Mittal, K.L.²

7
- 0001234018
- J. Leu and K. F. Jensen: J. Vac. Sci. & Technol. A 9 (1991) 2948.
- (1991) J. Vac. Sci. & Technol. A , vol.9 , pp. 2948
- Leu, J.¹ Jensen, K.F.²

8
- 21144479508
- S. Y. Wu, D. D. Denton and R. D. Souza-Machado: J. Vac. Sci. & Technol. A 11 (1993) 291.
- (1993) J. Vac. Sci. & Technol. A , vol.11 , pp. 291
- Wu, S.Y.¹ Denton, D.D.² Souza-Machado, R.D.³

9
- 0030193497
- Y. Y. Maruo, S. Sasaki, T. Haga, H. Kinoshita, T. Horiuchi and T. Tamamura: J. Vac. Sci. & Technol. A 14 (1996) 2470.
- (1996) J. Vac. Sci. & Technol. A , vol.14 , pp. 2470
- Maruo, Y.Y.¹ Sasaki, S.² Haga, T.³ Kinoshita, H.⁴ Horiuchi, T.⁵ Tamamura, T.⁶

10
- 0033333196
- S. H. Kim, H. S. Moon, S. G. Woo and J. Ahn: Jpn. J. Appl. Phys. 38 (1999) 7122.
- (1999) Jpn. J. Appl. Phys. , vol.38 , pp. 7122
- Kim, S.H.¹ Moon, H.S.² Woo, S.G.³ Ahn, J.⁴

11
- 20444421128
- Y. Liu, C. McMillian and F. Dall: Dig. 1998 the Dielectrics for ULSI/VLSI Multilevel Interconnections Conf., 1998, p. 305.
- (1998) Dig. 1998 the Dielectrics for ULSI/VLSI Multilevel Interconnections Conf. , pp. 305
- Liu, Y.¹ McMillian, C.² Dall, F.³

12
- 0030389376
- J. S. Park and W. I. Milne: Jpn. J. Appl. Phys. 35 (1996) L1550.
- (1996) Jpn. J. Appl. Phys. , vol.35
- Park, J.S.¹ Milne, W.I.²

13
- 0032184012
- B. Lucas, C. Moussant, A. Moliton and J. Zyss: Polymer Int. 47 (1998) p. 210.
- (1998) Polymer Int. , vol.47 , pp. 210
- Lucas, B.¹ Moussant, C.² Moliton, A.³ Zyss, J.⁴

14
- 0031363369
- K. Richter, M. Orfert and K. Drescher: Surf. & Coatings Technol. 97 (1997) 481.
- (1997) Surf. & Coatings Technol. , vol.97 , pp. 481
- Richter, K.¹ Orfert, M.² Drescher, K.³

15
- 5744226423
- M. R. Baklanov, S. Vanhaelemeersch, H. Bender and K. Maex: J. Vac. Sci. & Technol. B 17 (1999) 372.
- (1999) J. Vac. Sci. & Technol. B , vol.17 , pp. 372
- Baklanov, M.R.¹ Vanhaelemeersch, S.² Bender, H.³ Maex, K.⁴

16
- 0030102543
- K. Popova, E. Spassova, I. Zhivkov and G. Danev: Thin Solid Films 274 (1996) 31.
- (1996) Thin Solid Films , vol.274 , pp. 31
- Popova, K.¹ Spassova, E.² Zhivkov, I.³ Danev, G.⁴

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