Optimization of etching parameters of a fluorinated polyimide using the RIBE technique

Polymer International

Volumn 47, Issue 2, 1998, Pages 210-214

  Lucas, Bruno ^a  

^a UNIVERSITY OF LIMOGES   (France)

Author keywords

Etching rate; Fluorinated polyimide; Reactive ion beam etching; RIBE; Sputtering yield

Indexed keywords

CURRENT DENSITY; ION BEAMS; POLYIMIDES; REACTION KINETICS; REACTIVE ION ETCHING;

ETCHING RATE; REACTIVE ION BEAM ETCHING;

FLUORINE CONTAINING POLYMERS;

EID: 0032184012     PISSN: 09598103     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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