Absolute dosimetry for extreme ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 838-845

  Berger, Kurt W ^a   Campiotti, Richard H ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; DOSIMETRY; ELECTROMAGNETIC WAVE EMISSION; SENSORS; ULTRAVIOLET RADIATION; X RAYS;

ULTRAVIOLET LITHOGRAPHY;

PHOTORESISTS;

EID: 0033690031     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)