High-performance membrane mask for electron projection lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3237-3241

  Yamashita, Hiroshi ^a   Amemiya, Isao ^b   Nomura, Eiichi ^a   Nakajima, Ken ^a   Nozue, Hiroshi ^a  

^a NEC CORPORATION   (Japan)

^b HOYA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON SCATTERING; MASKS; MONTE CARLO METHODS; OPTICAL RESOLVING POWER; THICKNESS MEASUREMENT; THIN FILMS;

ANGULAR DISTRIBUTIONS; ELECTRON PROJECTION LITHOGRAPHY (EPL);

ELECTRON BEAM LITHOGRAPHY;

EID: 0034316172     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319829     Document Type: Article

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