Patterned negative electron affinity photocathodes for maskless electron beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3192-3196

  Schneider, J E ^a   Sen, P ^a   Pickard, D S ^a   Winograd, G I ^a   McCord, M A ^a   Pease, R F W ^a   Spicer, W E ^a   Baum, A W ^b   Costello, K A ^b   Davis, G A ^b  

^a STANFORD UNIVERSITY   (United States)

^b Intevac Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007042406     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590349     Document Type: Article

References (6)

1. J. E. Schneider, A. W. Baum, G. I. Winograd, R. F. W. Pease, M. A. McCord, W. E. Spicer, K. A. Costello, and V. W. Aebi, J. Vac. Sci. Technol. B 14, 3782 (1996).
2. A. W. Baum, J. E. Schneider, R. F. W. Pease, M. A. McCord, W. E. Spicer, K. A. Costello, and V. W. Aebi, J. Vac. Sci. Technol. B 15, 2707 (1997).
3. G. H. Jansen, Coulomb Interactions in Particle Beams (Academic, New York, 1990).
4. G. I. Winograd et al., J. Vac. Sci. Technol. (to be published).
5. A. W. Baum, J. E. Schneider, R. F. W. Pease, W. E. Spicer, K. A. Costello, and V. W. Aebi, Proceedings of the 1995 International Electron Device Meeting.
6. A. Y.-C. Yu, Doctoral dissertation, Stanford University, 1967.