Zone-plate array lithography (ZPAL): A new maskless approach

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 324-332

  Carter, D J D ^a   Gil, Dario ^a   Menon, R ^a   Djomehri, Ihsan J ^a   Smith, Henry I ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; COMPUTER SIMULATION; FOCUSING; IMAGE QUALITY; IMAGING TECHNIQUES; MASKS; MODULATION; SUBSTRATES; SYNCHROTRONS;

FRESNEL ZONE PLATES; MASKLESS LITHOGRAPHY METHOD; ZONE-PLATE ARRAY LITHOGRAPHY (ZPAL);

X RAY LITHOGRAPHY;

EID: 0032674960     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351104     Document Type: Conference Paper

References (14)