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Volumn 133, Issue 134, 2000, Pages 555-560

Comparison of structure and properties of SiOx coatings deposited by reactive pulsed magnetron sputtering (PMS) and by hollow cathode activated EB evaporation (HAD)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELASTIC MODULI; ELECTRON BEAMS; EVAPORATION; FRACTURE TOUGHNESS; HARDNESS; MAGNETRON SPUTTERING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROSITY; SILICA; STOICHIOMETRY; WEAR RESISTANCE;

EID: 0034310550     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00975-0     Document Type: Article
Times cited : (19)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.