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Volumn 133, Issue 134, 2000, Pages 555-560
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Comparison of structure and properties of SiOx coatings deposited by reactive pulsed magnetron sputtering (PMS) and by hollow cathode activated EB evaporation (HAD)
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Author keywords
[No Author keywords available]
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Indexed keywords
CATHODES;
ELASTIC MODULI;
ELECTRON BEAMS;
EVAPORATION;
FRACTURE TOUGHNESS;
HARDNESS;
MAGNETRON SPUTTERING;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POROSITY;
SILICA;
STOICHIOMETRY;
WEAR RESISTANCE;
ELECTRON BEAM EVAPORATION;
ANTIREFLECTION COATINGS;
ABRASION;
COATING;
SILICATE;
SPUTTERING;
WEAR RESISTANCE;
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EID: 0034310550
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(00)00975-0 Document Type: Article |
Times cited : (19)
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References (15)
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