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Volumn 35, Issue 2 SUPPL. B, 1996, Pages 1069-1072

Initial oxidation processes of H-terminated Si(100) surfaces studied by high-resolution electron energy loss spectroscopy

Author keywords

Bond angle; Central force network model; Force constant; H termination; HREELS; Oxidation process; SiO2; Structural change

Indexed keywords

ADSORPTION; AUGER ELECTRON SPECTROSCOPY; ELECTRON BEAMS; ELECTRON ENERGY LOSS SPECTROSCOPY; HYDROGEN; LOW ENERGY ELECTRON DIFFRACTION; OXIDATION; OXYGEN; SILICA; SUBSTRATES; SURFACES;

EID: 0030078956     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.1069     Document Type: Article
Times cited : (24)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.