SCOPUS 정보 검색 플랫폼

Volumn 147, Issue 10, 2000, Pages 3922-3930

Operational aspects of chemical mechanical polishing polish pad profile optimization

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; HEURISTIC METHODS; OPERATIONS RESEARCH; OPTIMIZATION; TOPOLOGY; WEAR OF MATERIALS;

DISK-RADIUS TO PAD-RADIUS; PAD WEAR RATE EQUATION; PRESTON EQUATION;

CHEMICAL MECHANICAL POLISHING;

EID: 0034295259 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1393997 Document Type: Article

Times cited : (36)

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