Advances in physically based erosion simulators for CMP

Journal of Electronic Materials

Volumn 25, Issue 10, 1996, Pages 1574-1580

  Runnels, Scott R ^a  

^a SOUTHWEST RESEARCH INSTITUTE   (United States)

Author keywords

Chemical mechanical planarization; Erosion; Oxide films; Stress

Indexed keywords

EID: 0000528977     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02655578     Document Type: Article

References (13)

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