메뉴 건너뛰기




Volumn 73, Issue 4, 1998, Pages 456-458

Precise control of atomic nitrogen production in an electron cyclotron resonance plasma using N2/noble gas mixtures

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000894797     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121898     Document Type: Article
Times cited : (25)

References (16)
  • 3
    • 0011669510 scopus 로고
    • in edited by S. Veprek and M. Venugopalan Springer, Berlin, Heidelberg
    • H. F. Winter, in Plasma Chemistry III, edited by S. Veprek and M. Venugopalan (Springer, Berlin, Heidelberg, 1988).
    • (1988) Plasma Chemistry III
    • Winter, H.F.1
  • 4
    • 0003807494 scopus 로고
    • in edited by R. Vanselow and R. F. Howe Springer, Berlin, Heidelberg
    • G. Ehrlich, in Chemistry and Physics of Solid Surfaces VII, edited by R. Vanselow and R. F. Howe (Springer, Berlin, Heidelberg, 1988).
    • (1988) Chemistry and Physics of Solid Surfaces VII
    • Ehrlich, G.1
  • 7
    • 21944433801 scopus 로고
    • For a series of review articles, see
    • For a series of review articles, see MRS Bull. XVII, No. 5 (1992).
    • (1992) MRS Bull. , vol.17 , Issue.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.