Reactions of Si-H to Si-X (X = halogen) bonds at H-terminated Si(111) surfaces in hydrogen halide solutions in the presence of oxidants

Electrochimica Acta

Volumn 45, Issue 28, 2000, Pages 4655-4662

  Zhou, Xiaowen ^a   Ishida, Masaki ^a   Imanishi, Akihito ^a   Nakato, Yoshihiro ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BROMINE COMPOUNDS; CHLORINE COMPOUNDS; ELECTRIC POTENTIAL; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN BONDS; IODINE COMPOUNDS; MOLECULAR VIBRATIONS; OXIDATION; OXYGEN; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROGEN BROMIDE; HYDROGEN CHLORIDE; HYDROGEN IODIDE;

SEMICONDUCTING SILICON;

EID: 0034291993     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(00)00617-4     Document Type: Article

References (33)

1. Yablonovitch E., Allara D.L., Chang C.C., Gimitter T., Bright T.B. Phys. Rev. Lett. 57:1986;249.
2. Grundner M., Schulz R. AIP Conf. Proc. 167:1988;329.
3. Graef D., Grundner M., Schulz R. J. Vac. Sci. Technol. A7:1989;808.
4. Takahagi T., Ishitani A., Kuroda H., Nagasawa Y. J. Appl. Phys. 69:1991;803.
5. Higashi G.S., Chabal Y.J., Trucks G.W., Raghavachari K. Appl. Phys. Lett. 56:1990;656.
6. Jakob P., Chabal Y.J. J. Chem. Phys. 95:1991;2897.
7. Kim Y., Lieber C.M. J. Am. Chem. Soc. 113:1991;2333.
8. Hessel H.E., Feltz A., Reiter M., Memmert U., Behm R.J. Chem. Phys. Lett. 186:1991;275.
9. Itaya K., Sugawara R., Morita Y., Tokumoto H. Appl. Phys. Lett. 60:1992;2534.
10. P. Allongue, V. Costa-Kieling, H. Gerischer, J. Electrochem. Soc. 140 (1993) 1009, 1018.
11. Kaji K., Yau S.-L., Itaya K. J. Appl. Phys. 78:1995;5727.
12. Morita M., Ohmi T., Hasegawa E., Kawakami M., Ohwada M. J. Appl. Phys. 68:1990;1272.
13. Niwano M., Kageyama J.I., Kurita K., Kinashi K., Takahashi I., Miyamoto N. J. Appl. Phys. 76:1994;2157.
14. Niwano M., Miura T., Miyamoto N. J. Electrochem. Soc. 145:1998;659.
15. Watanabe S., Sugita Y. Surf. Sci. 327:1995;1.
16. Tabe M., Yamamoto T. Appl. Phys. Lett. 69:1996;2222.
17. Morimoto K., Araki K., Yamashita K., Morita K., Niwa M. Appl. Surf. Sci. 117/118:1997;652.
18. Morisawa K., Ishida M., Yae S., Nakato Y. Electrochim. Acta. 44:1999;3725.
19. M. Fujitani, R. Hinogami, J.G. Jia, M. Ishida, K. Morisawa, S. Yae, Y. Nakato, Chem. Lett. (1997) 1041.
20. Ishida M., Morisawa K., Hinogami R., Jia J.G., Yae S., Nakato Y. Z. Phys. Chem. 212:1999;99.
21. Chabal Y.J., Higashi G.S., Raghavachari K., Burrows V.A. J. Vac. Sci. Technol. A7:1989;2104.
22. Burrows V.A., Chabal Y.J., Higashi G.S., Raghavachari K., Christman S.B. Appl. Phys. Lett. 53:1988;998.
23. Fukidome H., Matsumura M., Komeda T., Namba K., Nishioka Y. Electrochem. Solid-State Lett. 2:1999;393.
24. Himpsel F.J., McFeely F.R., Taleb-Ibrahimi A., Yarmoff J.A., Hollinger G. Phys. Rev. B. 38:1988;6084.
25. Allred A.L. J. Inorg. Nucl. Chem. 17:1961;215.
26. Sugita Y., Watanabe Y. Jpn. J. Appl. Phys. 38:1999;2427.
27. Andersohn L., Kohler U. Surf. Sci. 284:1993;77.
28. Weldon M.K., Stefanov B.B., Raghavachari K., Chabal Y.J. Phys. Rev. Lett. 29:1997;2851.
29. He Y., Thiry P.A., Yu L.M., Caudano R. Surf. Sci. 441:1995;331.
30. Niwano M., Kageyama J.I., Kinashi K., Miyamoto N. J. Vac. Sci. Technol. A12:1994;465.
31. Luo H., Chidsey C.E.D. Appl. Phys. Lett. 72:1998;477.
32. Lucovsky G. Solid State Commun. 29:1979;571.
33. Lucovsky G. J. Vac. Sci. Technol. 16:1979;1225.