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Volumn 36, Issue 20, 2000, Pages 1699-1700

Analytic model of parasitic capacitance attenuation in CMOS devices with hyper-thin oxides

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; SEMICONDUCTOR DEVICE MODELS; SUBSTRATES;

EID: 0034274999     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20001160     Document Type: Article
Times cited : (4)

References (11)
  • 1
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    • IEEE, Piscataway, NJ
    • MOMOSE, H.S., ONO, M., YOSHITOMI, T., OHGURO, T., MAKAMURA, S., SAITO, M., and IWAI, H.: 'Tunneling gate oxide approach to ultra-high current drive in small-geometry MOSFETs', Tech. Dig. IEDM, (IEEE, Piscataway, NJ, 1994), p. 593
    • (1994) Tech. Dig. IEDM , pp. 593
    • Momose, H.S.1    Ono, M.2    Yoshitomi, T.3    Ohguro, T.4    Makamura, S.5    Saito, M.6    Iwai, H.7
  • 3
    • 0031150209 scopus 로고    scopus 로고
    • Reliability and integration of ultra-thin gate dielectrics for advanced CMOS
    • BUCHANAN, D.A., and LO, S.-H.: 'Reliability and integration of ultra-thin gate dielectrics for advanced CMOS', Microelectron. Eng., 1997, 36, p. 13-20
    • (1997) Microelectron. Eng. , vol.36 , pp. 13-20
    • Buchanan, D.A.1    Lo, S.-H.2
  • 4
    • 0033169532 scopus 로고    scopus 로고
    • Impact of tunnel currents and channel resistance on the characterization of channel inversion layer charge and polysilicon-gate depletion of sub-20Å gate oxide MOSFETs
    • AHMED, K., IBOK, E., YEAP, G.C-F., XIANG, Q., OGLE, R., WORTMAN, J., and HAUSER, J.: 'Impact of tunnel currents and channel resistance on the characterization of channel inversion layer charge and polysilicon-gate depletion of sub-20Å gate oxide MOSFETs', IEEE Trans. Electron Devices, 1999, 46, (8), pp. 1650-1655
    • (1999) IEEE Trans. Electron Devices , vol.46 , Issue.8 , pp. 1650-1655
    • Ahmed, K.1    Ibok, E.2    Yeap, G.C.-F.3    Xiang, Q.4    Ogle, R.5    Wortman, J.6    Hauser, J.7
  • 5
    • 0001954222 scopus 로고    scopus 로고
    • Characterization of ultrathin oxides using electrical C-V and I-V measurements
    • National Institute of Standards and Technology (NIST), Gaithersburg, Maryland, 23-27 March
    • HAUSER, J., and AHMED, K.: 'Characterization of ultrathin oxides using electrical C-V and I-V measurements'. Proc. Characterization and Metrology for ULSI Technology Conf., National Institute of Standards and Technology (NIST), Gaithersburg, Maryland, 23-27 March 1998, pp. 235-239
    • (1998) Proc. Characterization and Metrology for ULSI Technology Conf. , pp. 235-239
    • Hauser, J.1    Ahmed, K.2
  • 7
    • 0032679052 scopus 로고    scopus 로고
    • MOS capacitance measurements for high-leakage thin dielectrics
    • YANG, K.J., and HU, C.: 'MOS capacitance measurements for high-leakage thin dielectrics', IEEE Trans. Electron. Devices, 1999, 46, (7), p. 1500-1501
    • (1999) IEEE Trans. Electron. Devices , vol.46 , Issue.7 , pp. 1500-1501
    • Yang, K.J.1    Hu, C.2
  • 8
    • 0022783887 scopus 로고
    • A new AC technique for accurate determination of channel charge and mobility in very thin oxide MOSFETs
    • CHOW, P.-M.D., and WANG, K.-L.: 'A new AC technique for accurate determination of channel charge and mobility in very thin oxide MOSFETs', IEEE Trans. Electron. Devices, 1986, 33, (9), p. 1299-1304
    • (1986) IEEE Trans. Electron. Devices , vol.33 , Issue.9 , pp. 1299-1304
    • Chow, P.-M.D.1    Wang, K.-L.2
  • 9
    • 0019027161 scopus 로고
    • Frequency response of charge transfer in MOS inversion layers
    • LIENEWEG, U.: 'Frequency response of charge transfer in MOS inversion layers', Solid-State Electron., 1980, 23, pp. 577-583
    • (1980) Solid-State Electron. , vol.23 , pp. 577-583
    • Lieneweg, U.1
  • 11
    • 0033579745 scopus 로고    scopus 로고
    • Analytic model for direct tunneling current in polycrystalline silicon-gate-metal-oxide-semiconductor devices
    • REGISTER, L.F., RAUSENBAUM, E., and YANG, K.: 'Analytic model for direct tunneling current in polycrystalline silicon-gate-metal-oxide-semiconductor devices', Appl. Phys. Lett., 1999, 74, (3), p. 457-459
    • (1999) Appl. Phys. Lett. , vol.74 , Issue.3 , pp. 457-459
    • Register, L.F.1    Rausenbaum, E.2    Yang, K.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.