Fabrication of a beam-mass structure using single-step electrochemical etching for micro structures (SEEMS)

Journal of Micromechanics and Microengineering

Volumn 10, Issue 3, 2000, Pages 440-444

  Ohji, H ^a   Gennissen, P T J ^b,c   French, P J ^b   Tsutsumi, K ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; ETCHING; MICROMACHINING;

ELECTROCHEMICAL ETCHING; WET ETCHING;

SEMICONDUCTING SILICON;

EID: 0034274487     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/10/3/320     Document Type: Article

References (12)

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