Macro porous silicon formation for micromachining

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3223, Issue , 1997, Pages 189-197

  Ohji, Hiroshi ^a   Lahteenmaki, Sami ^b   French, Patrick J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b AALTO UNIVERSITY   (Finland)

Author keywords

Micromachining; Porous silicon; Wet etching

Indexed keywords

COMPOSITE MICROMECHANICS; ELECTROCHEMICAL ETCHING; ELECTROMECHANICAL DEVICES; ETCHING; HYDROFLUORIC ACID; MACHINING; MICROANALYSIS; MICROFABRICATION; MICROMACHINING; NONMETALS; SILICON WAFERS; SINGLE CRYSTALS; STRUCTURAL OPTIMIZATION; WET ETCHING;

APPLIED VOLTAGES; CRYSTAL SILICONS; ETCH PARAMETERS; ETCH RATES; ETCHED SURFACES; HF CONCENTRATIONS; MICROMACHINED STRUCTURES; MICROMECHANICAL STRUCTURES; NEW TECHNIQUES; PORE DIAMETERS; PORE FORMATIONS; POROUS SILICON FORMATIONS;

POROUS SILICON;

EID: 34247566940     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.284480     Document Type: Conference Paper

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