Capabilities and limitations of plasma polymerized methylsilane (PPMS) all-dry lithography

Journal of Photopolymer Science and Technology

Volumn 11, Issue 4, 1998, Pages 651-662

  Dabbagh, Gary ^a   Hutton, Richard S ^a   Cirelli, Raymond A ^a   Novembre, Anthony E ^a   Reichmanis, Elsa ^a   Nalamasu, Omkaram ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

All dry lithography; Cvd resist; PPMS

Indexed keywords

EID: 0343415799     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.651     Document Type: Article

References (3)

1. Wallow, T.I.; Houlihan, F.M.; Nalamasu, O.; Chandross, E.A.; Neenan, T.X.; Reichmanis, E. Proc. SPIE, 1996,2724, 355.
2. Allen, R.A.; Wallraff, G.M.; Di Pietro, R.A.; Hofer, D.C.; Kunz, R.R. Proc. SPIE. 1995,2438,474.
3. Nalamasu, O.; Wallow, T.I.; Houlihan, P.M.; Reichmanis, E.; Timko, A.G.; Dabbagh, G.; Cirelli, R.A.; Hutton, R.S.; Novembre, A.E. Future Fab, Int., 1997,1(2), 159.