Application of plasma polymerized methylsilane for 0.18 μm photolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 366-375

  Monget, Cedric ^a   Lee, Carol Y ^b   Joubert, Olivier P ^a,c   Amblard, Gilles R ^a   Weidman, Timothy W ^d   Sugiarto, Dian ^d   Yang, John W ^b   Cormont, F ^a   Inglebert, R L ^e  

^a ORANGE LABS   (France)

^b INTEL CORPORATION   (United States)

^c INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^d APPLIED MATERIALS INC   (United States)

^e UNIVERSITÉ D'ORLÉANS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

APPLICATIONS; CHLORINE; COMPUTER GENERATED HOLOGRAPHY; MASKS; PLASMAS; SILICON COMPOUNDS; WAVEMETERS;

BI LAYERS; CHLORINE-BASED PLASMAS; CLUSTER TOOLS; DIELECTRIC DEPOSITIONS; GATE STACKS; HARD MASKS; HIGH DENSITY PLASMAS; HIGH SENSITIVITIES; METHYLSILANE; NEGATIVE TONES; NETWORK MATERIALS; ORGANIC RESISTS; OXIDE PATTERNS; PHOTOINDUCED OXIDATIONS; RESIST FILMS; SELECTIVE ETCHINGS; SHORT WAVELENGTHS; SINGLE LAYERS; SINGLE WAFERS; UNEXPOSED REGIONS;

OXIDE FILMS;

EID: 0009346717     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312426     Document Type: Conference Paper

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