Reduced reverse narrow channel effect in thin SOI nMOSFETs

IEEE Electron Device Letters

Volumn 21, Issue 9, 2000, Pages 412-414

  Chang, Chun Yen ^a   Chang, Sun Jay ^a   Chao, Tien Sheng ^b   Wu, Sung Dtr ^a   Huang, Tiao Yuan ^a,b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACES (MATERIALS); REDUCTION; SILICON ON INSULATOR TECHNOLOGY; THIN FILMS; THRESHOLD VOLTAGE;

REVERSE NARROW CHANNEL EFFECTS (RNCE);

MOSFET DEVICES;

EID: 0034259590     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)

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