Electromechanical properties and acoustic response of integrated PZT thin films

Journal of Materials Science Letters

Volumn 19, Issue 16, 2000, Pages 1477-1479

  Cho, C R ^a,b   Francis, L F ^a  

^a University of Minnesota   (United States)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PROPERTIES; LEAD COMPOUNDS; MICROELECTROMECHANICAL DEVICES; POLYCRYSTALLINE MATERIALS; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SENSORS; SUBSTRATES; THIN FILMS; X RAY CRYSTALLOGRAPHY;

PIEZOELECTRIC COEFFICIENT;

AMORPHOUS FILMS;

EID: 0034251033     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006744027172     Document Type: Article

References (16)

1. J. F. SCOTT and C. A. P. ARAUZO, Science 246 (1989) 1400.
2. B. G. POTTER, J. M. B. SINCLAIR and D. DIMOS, Appl. Phys. Lett. 63 (1993) 2180.
3. D. L. POLLA and L. F. FRANCIS, Ann. Rev. Mater. Sci. 28 (1998) 563.
4. P. MURALT, in Proc. 10th IEEE International Symposium on Applications of Ferroelectrics, East Brunswick, NJ August 1996, edited by B. M. Kulwicki, A. Amin and A. Safari (IEEE Piscataway, NJ, 1996) p. 145.
5. P. MURALT, M. KOHLI, T. MAEDER, A. KHOLKIN, K. BROOKS, N. SETTER and R. LUCTHIER, Sensors and Actuators A 48 (1995) 157.
6. M. SAYER, C. V. R. VASANT KUMAR, D. BARROW, L. ZOU and D. T. AMM, in Ferroelectric Thin Films II, Mater. Res. Soc. Symp. Proc., Vol. 243, edited by A. I. Kingon, E. R. Myers and B. Tuttle (MRS, Pittsburgh, PA, 1992) p. 39
7. C. LEE, IEEE Trans. Ultra. Ferro. Freq. Control 43 (1996) 553.
8. C. B. SCRUBBY, J. Phys. E: Sci. Instrum. 20 (1987) 946.
9. K. D. BUDD, S. K. DEY and D. A. PAYNE, Brit. Ceram. Proc. 36 (1985) 107.
10. J.-F. LI, P. MOSES and D. VIEHLAND, Rev. Sci. Instrum. 66 (1995) 215.
11. A. L. KHOLKIN, C. WUTCHRICH, D. V. TAYLOR and N. SETTER, Rev. Sci. Instr. 67 (1996) 1935.
12. E. L. COLLA, S. HONG, D. V. TAYLOR, A. K. TAGANTSEV, N. SETTER and K. NO, Appl. Phys. Lett. 72 (1998) 2763.
13. A. L. KHOLKIN, K. G. BROOKS, D. V. TAYLOR, S. HIBOUX and N. SETTER, Integrated Ferroelectrics 22 (1998) 1045.
14. J.-F. LI, D. VIEHLAND, T. TANI, C. D. E. LAKEMAN and D. A. PAYNE, J. Appl. Phys. 75 (1994) 442.
15. C.-R. CHO, W.-J. LEE, B.-G. YU and B.-W. KIM, ibid. 86 (1999) 2700.
16. C.-R. CHO, L. F. FRANCIS and M.-S. JANG, Jpn. J. Appl. Phys. 38 (1999) L751.