Dissociative adsorption of monomethylsilane on Si(100) as revealed by comparative temperature-programmed desorption studies on H/, C2H2/, and MMS/Si(100)

Applied Surface Science

Volumn 162, Issue , 2000, Pages 139-145

  Nakazawa, Hideki ^a   Suemitsu, Maki ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACETYLENE; ADSORPTION; CHEMICAL BONDS; CRYSTAL ATOMIC STRUCTURE; CRYSTAL ORIENTATION; DISSOCIATION; HYDROGEN; SILICON WAFERS; TEMPERATURE PROGRAMMED DESORPTION;

MONOMETHYLSILANE;

SILANES;

EID: 0034248424     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00182-3     Document Type: Article

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