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Applied Surface Science

Volumn 130-132, Issue , 1998, Pages 298-303

Higher-order desorption kinetics of hydrogen from silane/, disilane/, and D/Si(100)

(2) Nakazawa, Hideki a Suemitsu, Maki a

a TOHOKU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; HYDROGEN; HYDROGENATION; REACTION KINETICS; SATURATION (MATERIALS COMPOSITION); SEMICONDUCTING SILICON; SILANES;

HIGHER ORDER DESORPTION KINETICS;

TEMPERATURE PROGRAMMED DESORPTION;

EID: 0032098497 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(98)00074-9 Document Type: Article

Times cited : (6)

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