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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 4, 1997, Pages 1406-1410

Electron beam dot lithography for nanometer-scale tunnel junctions using a double-layered inorganic resist

(5) Haraichi, Satoshi a Wada, Toshimi a Gorwadkar, Sucheta M a,b Ishii, Kenichi a Hiroshima, Hiroshi a

a ELECTROTECHNICAL LABORATORY (Japan)

b New Energy and Industrial Technology Development Organization (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000909739 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.589549 Document Type: Article

Times cited : (9)

References (15)

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