Current status of single ion implantation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 2489-2493

  Shinada, Takahiro ^a   Kumura, Yoshinori ^a   Okabe, Jun ^a   Matsukawa, Takashi ^a   Ohdomari, Iwao ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000939702     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590196     Document Type: Article

References (6)

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2. T. Mizuno, J. Okamura, and A. Toriumi, IEEE Trans. Electron Devices 41, 2216 (1994).
3. I. Ohdomari, in Proceedings of the 1st International Symposium on Control of Semiconductor Interfaces, Karuizawa, Japan (North-Holland, Amsterdam, 1994), p. 223.
4. T. Matsukawa, T. Fukai, S. Suzuki, K. Hara, M. Koh, and I. Ohdomari, Appl. Surf. Sci. 117/118, 677 (1997).
5. T. Shinada, H. Kimura, Y. Kumura, and I. Ohdomari, Appl. Surf. Sci. 117/118, 684 (1997).
6. M. Rosler, W. Brauer, J. Devooght, J.-C. Debase, A. Dubus, M. Cailler, and J.-P. Ganachaud, Particle Induced Electron Emission I, Springer Tracts in Modern Physics 122 (Springer, Berlin, 1991).