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Volumn 15, Issue 7, 2000, Pages 756-760
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Low resistance Al/Ti/n-GaN ohmic contacts with improved surface morphology and thermal stability
a a a b |
Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
ELECTRIC CONDUCTIVITY;
HIGH TEMPERATURE PROPERTIES;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MORPHOLOGY;
MULTILAYERS;
NITRIDES;
OHMIC CONTACTS;
SEMICONDUCTING FILMS;
THERMODYNAMIC STABILITY;
GALLIUM NITRIDE;
SEMICONDUCTING GALLIUM COMPOUNDS;
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EID: 0034227948
PISSN: 02681242
EISSN: None
Source Type: Journal
DOI: 10.1088/0268-1242/15/7/316 Document Type: Article |
Times cited : (69)
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References (18)
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